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Amorphous-SiC thin-film p-i-n light-emitting diode using amorphous-SiN hot-carrier tunneling injection layers

机译:使用非晶SiN热载流子隧穿注入层的非晶SiC薄膜p-i-n发光二极管

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摘要

An approach to improve the luminosity of hydrogenated amorphous silicon carbide (a-SiC:H)-based thin-film visible light-emitting diodes is discussed. High bandgap near-stoichiometric hydrogenated amorphous silicon nitride (a-SiN:H) is utilized as a hot-carrier tunneling injection layer. An improvement of both carrier injection efficiency and luminosity is observed. Technical data on the new approach for carrier injection and on the recombination mechanism are presented. Preliminary results are also presented on the photoluminescence and electroluminescence properties of a-SiC:H/a-SiN:H multilayers.
机译:讨论了一种改善氢化非晶碳化硅(a-SiC:H)基薄膜可见光发光二极管的发光度的方法。高带隙近化学计量的氢化非晶氮化硅(a-SiN:H)被用作热载流子隧穿注入层。观察到载流子注入效率和发光度的改善。介绍了有关载体注入新方法和重组机理的技术数据。还给出了关于a-SiC:H / a-SiN:H多层膜的光致发光和电致发光性质的初步结果。

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