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首页> 外文期刊>IEEE Transactions on Electron Devices >Long-wavelength (0.1-1.6 mu m) In/sub 0.53/(Ga/sub x/Al/sub 1-x/)/sub 0.47/ As/In/sub 0.53/Ga/sub 0.47/As MSM photodiode
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Long-wavelength (0.1-1.6 mu m) In/sub 0.53/(Ga/sub x/Al/sub 1-x/)/sub 0.47/ As/In/sub 0.53/Ga/sub 0.47/As MSM photodiode

机译:长波长(0.1-1.6μm)In / sub 0.53 /(Ga / sub x / Al / sub 1-x /)/ sub 0.47 / As / In / sub 0.53 / Ga / sub 0.47 / As MSM光电二极管

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摘要

Summary form only given. The authors report a novel metal-semiconductor-metal (MSM) Schottky photodiode using a nominally lattice-matched In/sub 0.53/(Ga/sub x/Al/sub 1-x/) /sub 0.47/As (graded)/In/sub 0.53/Ga/sub 0.47/As structure grown by molecular beam epitaxy on a semi-insulating InP substrate. The approach to barrier enhancement uses a lattice-matched compositionally graded InGaAlAs capping layer. This lattice-matched layer does not suffer from the nonradiative recombination centers which can result from strained/relaxed layers or superlattice interfaces. Abrupt band-edge discontinuities, which inhibit the collection of photogenerated carriers, are also eliminated. A detector responsivity of 0.35 A/W was measured at 1.3 mu m with a 10-V applied bias; the corresponding internal quantum efficiency is in excess of 90%. The associated dark currents are very low: 35 nA at 10 V and 500 nA at 20 V. Detector capacitance was 70 fF. Preliminary high-speed measurements with a gain-switched 1.3- mu m laser diode show an instrumentation-limited impulse response of 55 ps.
机译:仅提供摘要表格。作者报告了一种使用标称晶格匹配的In / sub 0.53 /(Ga / sub x / Al / sub 1-x /)/ sub 0.47 / As(渐变)/ In的新型金属-半导体-金属(MSM)肖特基光电二极管通过分子束外延在半绝缘的InP衬底上生长的/ sub 0.53 / Ga / sub 0.47 / As结构。势垒增强方法使用晶格匹配的成分渐变的InGaAlAs覆盖层。该晶格匹配层不会遭受非辐射复合中心的影响,后者可能是由应变/松弛层或超晶格界面导致的。消除了抑制光生载流子收集的突然的带边不连续性。在施加10V偏压的情况下,在1.3μm处测得的检测器响应度为0.35A / W。相应的内部量子效率超过90%。相关的暗电流非常低:10 V时为35 nA,20 V时为500 nA。检测器电容为70 fF。使用增益切换的1.3微米激光二极管进行的初步高速测量显示,仪器限制的脉冲响应为55 ps。

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