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首页> 外文期刊>Electron Devices, IEEE Transactions on >Intrinsic Gain in Self-Aligned Polysilicon Source-Gated Transistors
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Intrinsic Gain in Self-Aligned Polysilicon Source-Gated Transistors

机译:自对准多晶硅源极门控晶体管的本征增益

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摘要

Thin-film self-aligned source-gated transistors (SGTs) have been made in polysilicon. The very high output impedance of this type of transistor makes it suited to analog circuits. Intrinsic voltage gains of greater than 1000 have been measured at particular drain voltages. The drain voltage dependence of the gain is explained based on the device physics of the SGT and the fact that a pinchoff occurs at both the source and the drain. The results obtained from these devices, which are far from optimal, suggest that, with a proper design, the SGT is well suited to a wide range of analog applications.
机译:薄膜自对准源极栅极晶体管(SGT)已用多晶硅制成。这种晶体管的输出阻抗非常高,使其适用于模拟电路。在特定的漏极电压下,本征电压增益大于1000。基于SGT的器件物理特性以及源极和漏极都发生夹断的事实来解释增益的漏极电压依赖性。从这些设备获得的结果远非最佳,这表明,通过适当的设计,SGT非常适合广泛的模拟应用。

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