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首页> 外文期刊>Electron Devices, IEEE Transactions on >High-Performance Long-Wavelength Infrared HgCdTe Focal Plane Arrays Fabricated on CdSeTe Compliant Si Substrates
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High-Performance Long-Wavelength Infrared HgCdTe Focal Plane Arrays Fabricated on CdSeTe Compliant Si Substrates

机译:在符合CdSeTe的Si衬底上制造的高性能长波长红外HgCdTe焦平面阵列

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At the U.S. Army Research Laboratory, a new ternary semiconductor system $ hbox{CdSe}_{x}hbox{Te}_{1 - x}/hbox{Si}(hbox{211})$ is being investigated as an alternative substrate to bulk-grown CdZnTe substrates for HgCdTe growth by molecular beam epitaxy. Long-wavelength (LW) photovoltaic devices fabricated on this compliant substrate material show diffusion limited performance at 78 K, indicating a high-quality material. The measured $hbox{R}_{o}hbox{A}$ at 78 K on $lambda_{rm co} = hbox{10} muhbox{m}$ material is on the order of 340 $Omega cdot hbox{cm}^{2}$. In addition to single devices, we have fabricated 256 $times$ 256 2-D arrays with a 40-$muhbox{m}$ pixel pitch on LW-HgCdTe grown on $hbox{CdSe}_{x}hbox{Te}_{1 - x}/hbox{Si}(hbox{211})$ compliant substrates. The data show an excellent quantum efficiency operability of 99% at 78 K under a tactical background flux of $hbox{6.7} times hbox{10}^{15} hbox{ph/cm}^{2}hbox{s}$ . The most probable dark current at peak distribution is $ hbox{5.5} times hbox{10}^{9} hbox{e-/s}$ and is very consistent with the measured $hbox{R}_{o}hbox{A}$ values from single devices. This work demonstrates that $hbox{CdSe}_{x}hbox{Te}_{1 - x}/hbox{Si}(hbox{211})$ substrates provid-ne a potential roadmap for more affordable robust third-generation focal plane arrays.
机译:在美国陆军研究实验室,正在研究一种新的三元半导体系统$ hbox {CdSe} _ {x} hbox {Te} _ {1-x} / hbox {Si}(hbox {211})$作为替代衬底通过分子束外延生长到大量生长的CdZnTe衬底上,用于HgCdTe的生长。在这种顺应性基板材料上制造的长波长(LW)光伏器件在78 K时显示出扩散受限的性能,表明该材料是高质量的。在$ lambda_ {rm co} = hbox {10} muhbox {m} $物质上于78 K处测得的$ hbox {R} _ {o} hbox {A} $材料约为340 $ Omega cdot hbox {cm} ^ {2} $。除了单个设备外,我们还在$ hbox {CdSe} _ {x} hbox {Te} _上生长的LW-HgCdTe上制造了256个$ times $ 256个2-D阵列,像素间距为40- $ muhbox {m} $符合{1-x} / hbox {Si}(hbox {211})$的基板。数据显示,在战术背景通量为$ hbox {6.7}乘以hbox {10} ^ {15} hbox {ph / cm} ^ {2} hbox {s} $的战术背景通量下,在78 K时具有99%的出色量子效率可操作性。峰值分布处最可能的暗电流是$ hbox {5.5}乘以hbox {10} ^ {9} hbox {e- / s} $,并且与测量的$ hbox {R} _ {o} hbox {A } $个来自单个设备的值。这项工作表明,$ hbox {CdSe} _ {x} hbox {Te} _ {1-x} / hbox {Si}(hbox {211})$衬底为潜在的路线图提供了负担得起的更强大的第三代焦点平面数组。

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