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Measurements and Simulations of Low Dark Count Rate Single Photon Avalanche Diode Device in a Low Voltage 180-nm CMOS Image Sensor Technology

机译:低低压180nm CMOS图像传感器技术中低暗计数率单光子雪崩二极管器件的测量和仿真

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This paper presents the key features of single photon avalanche diode (SPAD) devices fabricated in a low voltage commercial 180-nm CMOS image sensor technology exhibiting very low dark count rate (DCR). The measured DCR is ${<}{rm 100}~{rm Hz}$ at room temperature even for excess voltages above 2 V. The active junction of the SPAD measures 10 $mu{rm m}$ in diameter within a 24-$mu{rm m}$ test structure. The active region where Geiger avalanche occurs is determined by an implanted charge sheet. Edge avalanche is averted by utilizing a virtual guard ring, formed by the retrograde well profile. The design, measurements, and simulations of doping and electric field profiles that lead to such low DCR are reported and analyzed. The current–voltage characteristics and the temperature dependence of the breakdown voltage provide further, indirect evidence for the low DCR measured in the device. Thus, the key features of measured good SPADs are presented and are correlated with simulations that give physical insight on how to design high-performance SPADs.
机译:本文介绍了采用低压商业180 nm CMOS图像传感器技术制造的单光子雪崩二极管(SPAD)器件的关键特性,该器件具有极低的暗计数率(DCR)。在室温下,即使电压高于此值,测得的DCR仍为 $ {<} {rm 100}〜{rm Hz} $ 2V。SPAD的活动接点在24- <公式中的直径为10 $ mu {rm m} $ Formulatype =“ inline”> $ mu {rm m} $ 测试结构。发生盖革雪崩的有源区由注入的电荷片确定。通过利用由逆行井剖面形成的虚拟保护环来避免边缘雪崩。报告并分析了导致如此低的DCR的掺杂和电场分布图的设计,测量和仿真。击穿电压的电流电压特性和温度相关性进一步为器件中测得的低DCR提供了间接证据。因此,介绍了所测得的良好SPAD的关键特征,并将其与仿真相关联,这些仿真为如何设计高性能SPAD提供了物理见解。

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