首页> 外文期刊>Electron Devices, IEEE Transactions on >An Improved Virtual-Source-Based Transport Model for Quasi-Ballistic Transistors—Part I: Capturing Effects of Carrier Degeneracy, Drain-Bias Dependence of Gate Capacitance, and Nonlinear Channel-Access Resistance
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An Improved Virtual-Source-Based Transport Model for Quasi-Ballistic Transistors—Part I: Capturing Effects of Carrier Degeneracy, Drain-Bias Dependence of Gate Capacitance, and Nonlinear Channel-Access Resistance

机译:一种改进的基于虚拟源的准弹道晶体管传输模型—第一部分:载流子退化,栅极电容的漏偏压依赖性和非线性通道访问电阻的捕获效应

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摘要

In this paper, an improved physics-based virtual-source (VS) model to describe transport in quasi-ballistic transistors is discussed. The model is based on the Landauer scattering theory, and incorporates the effects of: 1) degeneracy on thermal velocity and mean free path of carriers in the channel; 2) drain-bias dependence of gate capacitance and VS charge, including the effects of band nonparabolicity; and 3) nonlinear resistance of the extrinsic device region on -degradation at high drain currents in the channel. The improved charge model captures the phenomenon of reduction in VS charge under nonequilibrium transport conditions in a quasi-ballistic transistor.
机译:本文讨论了一种改进的基于物理的虚拟源(VS)模型,用于描述准弹道晶体管中的传输。该模型基于Landauer散射理论,并包含以下影响:1)简并性对通道中载流子的热速度和平均自由程的影响; 2)栅极电容和VS电荷的漏极偏置关系,包括带非抛物线效应; 3)在沟道中的高漏极电流下,外部器件区域在退化时的非线性电阻。改进的电荷模型捕获了准弹道晶体管在非平衡传输条件下VS电荷减少的现象。

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