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首页> 外文期刊>Electron Devices, IEEE Transactions on >An Improved Virtual-Source-Based Transport Model for Quasi-Ballistic Transistors—Part II: Experimental Verification
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An Improved Virtual-Source-Based Transport Model for Quasi-Ballistic Transistors—Part II: Experimental Verification

机译:一种改进的基于虚拟源的准弹道晶体管传输模型—第二部分:实验验证

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摘要

In the first part of this two-part paper, a revised MIT virtual-source (MVS)-based transport model, called MVS-2, is presented. The MVS-2 model captures the essential physics of quasi-ballistic nanotransistors by accounting for the effects of: 1) degeneracy on the thermal velocity and the mean free path of the carriers in the channel; 2) nonequilibrium transport conditions on the gate–channel capacitance; and 3) the conduction band nonparabolicity on the effective mass of the carriers. The formulation of the extrinsic device regions as nonlinear current-dependent resistances allows MVS-2 to describe the degradation in the device transconductance under high drain currents as measured experimentally in InGaAs quantum well HEMT devices. In this paper, we test the accuracy of the MVS-2 model by comparing the model results with the measured – data of the InGaAs HEMT devices with gate lengths from 30 to 130 nm and Si extremely thin silicon on insulator devices with gate lengths from 30 to 50 nm. We also discuss why at the expense of some physical rigor the basic MVS model can fit more simply the experimental data (except for the degradation in transconductance under high drain currents).
机译:在这个由两部分组成的论文的第一部分中,提出了一种经过修改的基于MIT虚拟源(MVS)的传输模型,称为MVS-2。通过考虑以下影响,MVS-2模型捕获了准弹道纳米晶体管的基本物理特性:1)简并性对通道中载流子的热速度和平均自由程的影响; 2)栅极-沟道电容上的非平衡传输条件; 3)载流子有效质量的导带非抛物线性。将非本征器件区域表示为非线性电流相关电阻,使MVS-2能够描述在InGaAs量子阱HEMT器件中实验测量的高漏电流下器件跨导的退化。在本文中,我们通过将模型结果与栅极长度为30至130 nm的InGaAs HEMT器件以及栅极长度为30的绝缘体器件上的Si极薄硅的测量结果进行比较,来测试MVS-2模型的准确性至50纳米。我们还讨论了为什么以牺牲一些物理严谨性为代价,基本的MVS模型可以更简单地拟合实验数据(除了在高漏极电流下跨导的退化之外)。

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