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Dual-Gate JFET Modeling I: Generalization to Include MOS Gates and Efficient Method to Calculate Drain–Source Saturation Voltage

机译:双栅极JFET建模I:包括MOS栅极的通用化和一种计算漏源饱和电压的有效方法

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This paper presents an accurate and computationally efficient method to calculate the drain–source saturation voltage of dual-gate (i.e., four-terminal) junction field-effect transistors. The method accounts for velocity saturation and for channel thickness modulation by any combination of MOS or p-n junction gates. In three iterations, it achieves an error of less than 2%. Our algorithm converges significantly faster than the direct application of the Newton–Raphson method because of careful selection of an initial value and the leverage of the convex and concave nature of the curves whose intersection defines . The method is applied to both the exact model for and an approximated form based on mid-point-potential linearization, and is verified by comparison with numerical simulation.
机译:本文提出了一种精确且计算效率高的方法来计算双栅极(即四端子)结场效应晶体管的漏极-源极饱和电压。该方法考虑了速度饱和和通过MOS或p-n结门的任意组合进行的沟道厚度调制。在三个迭代中,它实现了小于2%的误差。由于精心选择了初始值并利用了交点定义的曲线的凹凸特性,我们的算法收敛速度比直接应用Newton-Raphson方法快得多。该方法既适用于精确模型,也适用于基于中点电位线性化的近似形式,并与数值模拟进行了比较验证。

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