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Improvement in Sensing Responses to Ammonia Gas for Gas Sensors With Separately Designed Sensing Element Using ALD-Grown ZnO Nanoparticles and Read-Out Element of Top-Gate In-Ga-Zn-O Thin-Film Transistor

机译:使用ALD生长的ZnO纳米粒子和顶部栅极In-Ga-Zn-O薄膜晶体管的读出元件分别设计的传感元件,改善了气体传感器对氨气的传感响应。

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Ammonia (NH3) gas sensors with unique oxide semiconductor thin-film transistor (TFT) configuration using ZnO nanoparticles (NPs) as gas-sensing element were fabricated and their gas-sensing responses were evaluated. The ZnO NPs composing the sensing elements were synthesized using atomic layer deposition (ALD). The optimum ALD conditions for the particle-like island-growth of ZnO were established by systematically investigating the ALD temperature and cycle conditions from 140 °C to 160 °C and from 5 to 30, respectively. Controlled devices of the sensor TFTs were prepared with different ALD conditions, in which sensing and read-out elements were designed to be physically separated. This unique device configuration provided us both benefits of improvement in gas-sensing property and stability of the device characteristics. The device showed instant gas responses as well as stable device behaviors at different operating temperature even with repeated gas measurements. Sufficiently good response to NH3 were obtained at 150 °C, which was significantly lower than the operating temperature of previously reported NH3 gas sensors. Based on the results the combination of novel TFT configuration and ALD-prepared ZnO NPs could be an effective method for the improvement in device characteristics of the gas sensors.
机译:制作了具有独特的氧化物半导体薄膜晶体管(TFT)结构的氨(NH3)气体传感器,该传感器使用ZnO纳米颗粒(NPs)作为气敏元件,并评估了其气敏响应。使用原子层沉积(ALD)合成了组成传感元件的ZnO NP。通过系统地研究ALD温度和从140°C到160°C和从5到30的循环条件,确定了ZnO颗粒状岛状生长的最佳ALD条件。传感器TFT的受控设备是在不同的ALD条件下制备的,其中传感和读出元件被设计为在物理上分离。这种独特的器件配置既为我们提供了改善气敏特性的好处,又为器件特性提供了稳定性。即使重复进行气体测量,该设备在不同的工作温度下也能显示出即时的气体响应以及稳定的设备性能。在150°C下获得了对NH3的足够好的响应,这大大低于先前报道的NH3气体传感器的工作温度。基于这些结果,将新颖的TFT配置与ALD制备的ZnO NP结合起来可以成为改善气体传感器器件特性的有效方法。

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