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Stand-by Power Reduction Using Experimentally Demonstrated Nano-Electromechanical Switch in CMOS Technologies

机译:使用实验证明的CMOS技术纳米机电开关进行功率降低

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In this article, we demonstrate a double-clamped nano-electromechanical switch (NEMS) with low stand-by power as an effective solution to the leakage issues in scaled CMOS-based power gating (PG) in logic circuits. The proposed NEMS structure is achieved to have a low pull-in (~1.2 V), low hysteresis (<0.3 V), low turn-on delay (35 ns), and subthreshold slope of <6 mV/decade. This enables reduction in stand-by power dissipation in sub 10-nm CMOS technologies with a narrow 100 nm dimple gap for the low-power NEMS. We illustrate that the PG in ISCAS’85 benchmark circuits using the proposed fabricated NEMS shows significant leakage energy reduction for ${T}_{ext{ON}}/{T}_{ext{OFF}} < {0.01}$ as compared to the sub 10-nm CMOS based PG.
机译:在本文中,我们展示了一个双夹紧的纳米机电开关(NEM),具有低待机功率,作为逻辑电路中缩放的基于CMOS的功率门控(PG)中的泄漏问题的有效解决方案。所提出的NEMS结构达到较低的拉入(〜1.2V),低滞后(<0.3V),低导通延迟(35ns),以及<6 mV /十年的亚阈值斜率。这使得能够在Sub 10-NM CMOS技术中降低级电力功耗,其具有窄的100nm凹坑间隙,用于低功率NEM。我们说明了ISCAS'85基准电路中的PG使用所提出的制造的NEMS显示出对<内联XMLNS:MML =“http://www.w3.org/1998/math/mathml”xmlns:xlink的显着泄漏能量减少=“http://www.w3.org/1999/xlink”> $ {t} _ { text {上}} / {t} _ { text {off}与基于Sub 10-NM CMOS的PG相比,<{0.01} $

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