首页> 外文期刊>IEEE Transactions on Electron Devices >A Device-to-System Perspective Regarding Self-Heating Enhanced Hot Carrier Degradation in Modern Field-Effect Transistors: A Topical Review
【24h】

A Device-to-System Perspective Regarding Self-Heating Enhanced Hot Carrier Degradation in Modern Field-Effect Transistors: A Topical Review

机译:从器件到系统的观点,研究现代场效应晶体管中自加热增强的热载流子性能:主题综述

获取原文
获取原文并翻译 | 示例
       

摘要

As foreseen by Keyes in the late 1960s, the self-heating effect has emerged as an important concern for device performance, output power density, run-time variability, and reliability of modern field-effect transistors. The self-heating effect is aggravated as the device footprint scales down for higher level of integration (low-power devices) or as the devices are operated in ultrahigh voltage regimes (high-power devices). In this article, we focus on the implications of self-heating on hot carrier degradation (HCD) of modern transistors by integrating within a coherent theoretical framework a broad range of experimental data scattered in the literature. We explain why system integration exacerbates transistor self-heating, while high-frequency digital operation ameliorates it, suggesting an opportunity for co-optimization. We conclude this article by discussing the various material-device-system design strategies to reduce HCD and suggesting open problems for further research.
机译:正如凯斯(Keyes)在1960年代后期所预见的那样,自热效应已成为对器件性能,输出功率密度,运行时间可变性以及现代场效应晶体管可靠性的重要关注。随着器件占板面积缩小以实现更高的集成度(低功率器件),或者器件在超高压状态下运行(高功率器件),自发热效应会加剧。在本文中,我们通过在一个连贯的理论框架内整合散布在文献中的大量实验数据,来关注自发热对现代晶体管的热载流子退化(HCD)的影响。我们解释了为什么系统集成会加剧晶体管自发热,而高频数字操作会改善晶体管自发热,这说明了进行协同优化的机会。我们通过讨论减少HCD的各种材料-设备-系统设计策略来总结本文,并提出需要进一步研究的未解决问题。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号