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首页> 外文期刊>IEEE Electron Device Letters >Temperature dependence of threshold voltage in thin-film SOI MOSFETs
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Temperature dependence of threshold voltage in thin-film SOI MOSFETs

机译:薄膜SOI MOSFET中阈值电压的温度依赖性

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摘要

A first-order model for the temperature dependence of threshold voltage in thin-film silicon-on-insulator (SOI) n-MOSFETs is described. The temperature dependence of the threshold voltage of thin-film SOI n-channel MOSFETs is analyzed. Threshold voltage variation with temperature is significantly smaller in thin-film (fully depleted) devices than in thick-film SOI and bulk devices. The threshold voltage is shown to be dependent on the depletion level of the device, i.e. whether it is fully depleted or not. There exists a critical temperature below which the device is fully depleted, and above which the device operates in the thick-film regime.
机译:描述了用于绝缘体薄膜硅(SOI)n-MOSFET中阈值电压与温度的关系的一阶模型。分析了薄膜SOI n沟道MOSFET阈值电压的温度依赖性。薄膜(完全耗尽)器件中的阈值电压随温度变化明显小于厚膜SOI和体器件。示出阈值电压取决于装置的耗尽水平,即,其是否被完全耗尽。存在一个临界温度,在该临界温度以下该器件完全耗尽,在该临界温度以上该器件以厚膜状态工作。

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