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首页> 外文期刊>IEEE Electron Device Letters >Extension of impact-ionization multiplication coefficient measurements to high electric fields in advanced Si BJT's
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Extension of impact-ionization multiplication coefficient measurements to high electric fields in advanced Si BJT's

机译:将冲击电离倍增系数测量扩展到高级Si BJT的高电场

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Measurements of the impact-ionization multiplication coefficient M-1 in advanced Si BJTs up to values in excess of 10 (corresponding to a peak electric field at the base-collector junction of about 9*10/sup 5/ V/cm) are presented. The intrinsic limitations affecting M-1 measurements at high electric fields are discussed. In particular, the fundamental role played by the negative base current and the parasitic base resistance in determining instabilities during M-1 measurements is pointed out. An accurate theoretical prediction of the M-1 coefficient on collector-base voltages close to BV/sub CBO/ requires that the contribution of holes to impact ionization be properly accounted for.
机译:提出了先进Si BJT中冲击电离倍增系数M-1的测量值,其值超过10(对应于基极-集电极结处的峰值电场约为9 * 10 / sup 5 / V / cm)。 。讨论了在高电场下影响M-1测量的固有限制。特别指出了负基极电流和寄生基极电阻在确定M-1测量过程中的不稳定性中所起的基本作用。对集电极-基极电压接近BV / sub CBO /的M-1系数进行精确的理论预测,需要适当考虑空穴对电离的影响。

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