首页> 外文期刊>Electron Device Letters, IEEE >0.34 src='/images/tex/32595.gif' alt='text{V}_{mathrm {T}}'> AlGaN/GaN-on-Si Large Schottky Barrier Diode With Recessed Dual Anode Metal
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0.34 src='/images/tex/32595.gif' alt='text{V}_{mathrm {T}}'> AlGaN/GaN-on-Si Large Schottky Barrier Diode With Recessed Dual Anode Metal

机译:0.34 src =“ / images / tex / 32595.gif” alt =“ text {V} _ {mathrm {T}}”> AlGaN / GaN-on-Si带有嵌入式双阳极金属的肖特基势垒二极管

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摘要

A large GaN-Schottky barrier diode (SBD) with a recessed dual anode metal is proposed to achieve improved the forward characteristics without a degradation of the reverse performances. Using optimized dry etch condition for a large device, the electrical characteristics of the device are demonstrated when applying the recessed dual anode metal and changing the recess depths. The device size and channel width are 4 mm and 63 mm, respectively. The 16-nm recessed dual anode metal SBD has a turn- voltage of 0.34 V, a breakdown voltage of 802 V, and a reverse leakage current of /mm at −15 V. The packaged SBD exhibits a forward current of 6.2 A at 2 V and a reverse recovery charge of 11.54 nC.
机译:提出了具有凹进双阳极金属的大型GaN-肖特基势垒二极管(SBD),以实现改善的正向特性而不会降低反向性能。在大型器件上使用优化的干法蚀刻条件,当施加凹进的双阳极金属并更改凹进深度时,将演示该器件的电气特性。器件尺寸和通道宽度分别为4 mm和63 mm。 16纳米凹进双阳极金属SBD的转向电压为0.34 V,击穿电压为802 V,在-15 V时的反向泄漏电流为/ mm。封装的SBD在2 V时的正向电流为6.2 A V,反向恢复电荷为11.54 nC。

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