首页> 外文期刊>Electron Device Letters, IEEE >4-kV and 2.8- src='/images/tex/27306.gif' alt='text{m}Omega '> -cm2 Vertical GaN p-n Diodes With Low Leakage Currents
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4-kV and 2.8- src='/images/tex/27306.gif' alt='text{m}Omega '> -cm2 Vertical GaN p-n Diodes With Low Leakage Currents

机译:4-kV和2.8- src =“ / images / tex / 27306.gif” alt =“ text {m} Omega”> -cm 2 具有低泄漏电流的垂直GaN pn二极管

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摘要

There is great interest in bulk GaN-based power electronics devices for applications requiring breakdown voltages greater than 3.3 kV. In this letter, the vertical GaN p-n diodes fabricated on improved bulk GaN substrates demonstrating low leakage currents (<10 nA) and avalanche breakdown are discussed. The device layers are grown by metal–organic chemical vapor deposition on low defect density ( cm) bulk GaN substrates with improved quality and specifications that are uniquely suitable for power electronic device applications. The measured devices show breakdown voltages larger than 4 kV with an area differential specific ON-resistance () of less than 3 -cm. Applications that would require such breakdown voltages, include ship propulsion, rail, wind, uninterruptable power supplies, and the power grid.
机译:对于要求击穿电压大于3.3 kV的应用,基于体GaN的功率电子器件引起了极大的兴趣。在这封信中,讨论了在改进的块状GaN衬底上制造的垂直GaN p-n二极管,这些二极管显示出低漏电流(<10 nA)和雪崩击穿。通过在低缺陷密度(cm)的块状GaN衬底上进行金属有机化学气相沉积来生长器件层,其质量和规格得到了改善,特别适合于功率电子器件应用。被测器件的击穿电压大于4 kV,面积差分比导通电阻()小于3 -cm。需要此类击穿电压的应用包括船舶推进,铁路,风能,不间断电源和电网。

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