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首页> 外文期刊>Electron Device Letters, IEEE >AlGaN/GaN Metal–Oxide–Semiconductor Heterojunction Field-Effect Transistor Integrated With Clamp Circuit to Enable Normally-Off Operation
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AlGaN/GaN Metal–Oxide–Semiconductor Heterojunction Field-Effect Transistor Integrated With Clamp Circuit to Enable Normally-Off Operation

机译:集成有钳位电路的AlGaN / GaN金属-氧化物-半导体异质结场效应晶体管,实现常关工作

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摘要

We have developed an AlGaN/GaN-on-Si metal–oxide–semiconductor heterojunction field-effect transistor (MOSHFET) integrated with a clamp circuit to enable normally-off operation. A clamp circuit consisting of a multilayer MIM capacitor and a Schottky barrier diode was monolithically integrated with a normally ON AlGaN/GaN MOSHFET. The integrated clamp circuit shifted the input driving signal from (0, 20 V) to (−19.2, 0.8 V), allowing the normally ON AlGaN/GaN MOSHFET with a pinchoff voltage of −14 V to be operated as a normally-off device. The multichannel device with a 5-mm channel width exhibited a drain current density of mA/mm and a breakdown voltage of >900 V. In comparison with other conventional normally-off GaN-based FETs, a higher threshold voltage with high current density (i.e., low ON-resistance) can be achieved with easy device processing, no need for gate recess or complicated epitaxial growth.
机译:我们已经开发了一种集成有钳位电路的AlGaN / GaN-on-Si金属氧化物半导体异质结场效应晶体管(MOSHFET),以实现常关操作。由多层MIM电容器和肖特基势垒二极管组成的钳位电路与常开的AlGaN / GaN MOSHFET单片集成。集成的钳位电路将输入驱动信号从(0,20 V)转换为(-19.2,0.8 V),从而允许夹断电压为-14 V的常开AlGaN / GaN MOSHFET用作常关器件。沟道宽度为5mm的多沟道器件的漏极电流密度为mA / mm,击穿电压> 900 V.与其他常规的常关型GaN基FET相比,较高的阈值电压具有较高的电流密度(即,低导通电阻可以通过简单的器件工艺来实现,无需栅极凹槽或复杂的外延生长。

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