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Impact of Varying Indium(x) Concentration and Quantum Confinement on PBTI Reliability in InxGa1-xAs FinFET

机译:In x Ga 1-x As FinFET中铟(x)浓度和量子浓度的变化对PBTI可靠性的影响

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摘要

In this letter, we present a comparative study of positive bias temperature instability (PBTI) reliability in InGaAs FinFET with varying Indium (, 0.70) percentage and quantization [bulk, quantum well (QW)]. Due to lower effective transport mass and higher injection velocity, InGaAs QW FinFET provides better performance than InGaAs bulk FinFET. However, stronger quantization lowers the effective barrier height between the carriers and defect density in the oxide causing degraded PBTI reliability in the former. Our preliminary PBTI stress study shows that InGaAs QW FinFETs may need to operate at a gate overdrive of 0.1 V (i.e., near threshold operation) to meet 10 years of reliability specifications at 85 °C.
机译:在这封信中,我们将对InGaAs FinFET中具有可变的铟(,0.70)百分比和量化[批量,量子阱(QW)]的正偏置温度不稳定性(PBTI)可靠性进行比较研究。由于较低的有效传输质量和较高的注入速度,InGaAs QW FinFET提供的性能优于InGaAs体FinFET。但是,更强的量化会降低载流子之间的有效势垒高度,并降低氧化物中的缺陷密度,从而导致前者的PBTI可靠性下降。我们的初步PBTI应力研究表明,InGaAs QW FinFET可能需要在0.1 V的栅极过驱动下工作(即接近阈值工作),才能在85°C下满足10年的可靠性要求。

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