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首页> 外文期刊>IEEE Electron Device Letters >Tunable Stability of All-Inkjet-Printed Double-Gate Carbon Nanotube Thin Film Transistors
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Tunable Stability of All-Inkjet-Printed Double-Gate Carbon Nanotube Thin Film Transistors

机译:全喷墨印刷双栅碳纳米管薄膜晶体管的可调稳定性

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摘要

In this letter, we improved the stability of all-inkjet-printed carbon nanotube thin film transistors (CNT TFTs) by employing a double gate (DG) structure under an optimal bias condition. In the single-gate structure, the positive threshold voltage (VTH) shift under 10 V positive gate bias stress (PGBS) was significantly reduced with poly(4-vinylphenol) passivation. However, after 100 s, the on-current level was decreased, and a large negative VTH shift was observed. We adopted DG CNT TFTs for a further improvement. When-3V was applied to the top gate, the DG CNT TFTs not only exhibited a much lower VTH shift but also showed a stabilized on-current level. When an appropriate bias is applied to the top gate, charge trapping is induced at the top gate interface and it might balance between the positive and negative shifts. As a result, the overall stress effect is reduced. The p-type only inverter adopting a DG CNT TFT showed improved stability under -3 V of top gate bias. Our experimental result shows that DG structure is a promising candidate for various CNT circuit designs.
机译:在这封信中,我们通过在最佳偏置条件下采用双栅极(DG)结构来改善全喷墨印刷的碳纳米管薄膜晶体管(CNT TFT)的稳定性。在单栅极结构中,用聚(4-乙烯基酚)钝化显着降低10V正栅偏置应力(PGB)下的正阈值电压(Vth)偏移。然而,在100秒之后,降低电流水平,并且观察到大的负Vth偏移。我们采用了DG CNT TFT进一步改进。当-3V被施加到顶部栅极时,DG CNT TFT不仅表现出大得多的VTH偏移,而且还显示出稳定的电流水平。当将适当的偏置施加到顶部栅极时,在顶部栅极接口处引起电荷俘获,并且可能在正偏移之间平衡。结果,整体应力效应降低。 P型仅采用DG CNT TFT的逆变器显示出在-3 v的顶部栅极偏置下的稳定性提高。我们的实验结果表明,DG结构是各种CNT电路设计的有希望的候选者。

著录项

  • 来源
    《IEEE Electron Device Letters》 |2020年第6期|860-863|共4页
  • 作者单位

    Seoul Natl Univ Dept Elect & Comp Engn Seoul 08826 South Korea|Seoul Natl Univ Interuniv Semicond Res Ctr Seoul 08826 South Korea;

    Seoul Natl Univ Dept Elect & Comp Engn Seoul 08826 South Korea|Seoul Natl Univ Interuniv Semicond Res Ctr Seoul 08826 South Korea;

    Seoul Natl Univ Dept Elect & Comp Engn Seoul 08826 South Korea|Seoul Natl Univ Interuniv Semicond Res Ctr Seoul 08826 South Korea;

    Seoul Natl Univ Dept Elect & Comp Engn Seoul 08826 South Korea|Seoul Natl Univ Interuniv Semicond Res Ctr Seoul 08826 South Korea;

    Seoul Natl Univ Dept Elect & Comp Engn Seoul 08826 South Korea|Seoul Natl Univ Interuniv Semicond Res Ctr Seoul 08826 South Korea;

    Seoul Natl Univ Dept Elect & Comp Engn Seoul 08826 South Korea|Seoul Natl Univ Interuniv Semicond Res Ctr Seoul 08826 South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Carbon nanotubes; double-gate FETs; solution process; stability; thin film transistors;

    机译:碳纳米管;双栅FET;溶液过程;稳定性;薄膜晶体管;

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