Offset Difference Measure Enhancement for the Feature-Selective Validation Method

摘要

The feature-selective validation (FSV) method is proving itself to be a robust and helpful technique to quantify visually complex measurement sets, such as those resulting from computational electromagnetic validation exercises or experimental repeatability studies. This paper reports on an enhancement to this technique that includes data related to the level of dc difference (i.e., offset) between two sets of results, hitherto disregarded within the method. This offset difference measure (ODM) contributes to the amplitude difference measure (ADM) and ensures that the ADM and global difference measure values reflect the level of disagreement between the two traces even if this is the only difference between the two. The paper describes the background to this development and provides details of the selection and implementation of the ODM measure.