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N.I.P. Silicon Junctions Detectors

机译:掐。硅结检测器

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N.I.P. Silicon junctions have been studied as particle detectors. They consist of a 1.000 ¿.cm silicon plate on each side of which respectively a P and N layer have been diffused in order to have a NIP structure. The incident particles 9 to 40 MeV alpha, are parallel with the junctions planes, and strike the detector in the I region. An energy resolution of 2 % and a good linearity of pulse height vs particle energy up to 40 MeV have been obtained. In addition, gamma rays have been detected with NIP junctions, and pulse height distribution of Co60, Ca137 and Hg203 have been stutied. The average amount of energy expended by a photoelectric electron in creating one electron-hole pair in silicon has been measured and is found to be : E = 3,53±0,07 eV for 279 keV electrons E = 3,55±0,1 eV for 660 keV electrons.
机译:掐。已经研究了硅结作为颗​​粒检测器。它们由一个1.000×.cm的硅板组成,在其每侧分别扩散了P和N层以具有NIP结构。入射粒子9至40 MeV alpha与交界平面平行,并在I区域撞击检测器。已经获得了2%的能量分辨率和良好的脉冲高度与40 MeV的粒子能量线性关系。此外,已通过NIP结检测到了伽马射线,并研究了Co60,Ca137和Hg203的脉冲高度分布。光电电子在硅中创建一个电子-空穴对所消耗的平均能量已被测量,发现是:对于279 keV电子,E = 3,53±0.07 eV E = 3,55± 660 keV电子的±0.1 eV。

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