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Turn-on voltage reduction of organic light-emitting diode using a nickel-doped indium tin oxide anode prepared by single target sputtering

机译:使用单靶溅射制备的掺镍铟锡氧化物阳极降低有机发光二极管的开启电压

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Organic light-emitting diodes (OLEDs) with a nickel (NiJ-doped indium tin oxide (ITO) anode were fabricated. The Ni-doped ITO anode was prepared using sputter deposition of Ni-ITO single targets consisting of 1, 3 and 5 wt% of nickel. Turn-on voltage of OLED devices with the Ni-doped ITO anode was reduced by 2.5, 4 and 3.8 V for 1, 3 and 5 wt% targets, respectively. Half-luminance lifetime was improved by 2.5 times with a Ni(3 wt%)-ITO single target. The successful development in preparing Ni-doped ITO films by Ni-ITO single target sputtering allows this approach to be adopted for OLED manufacturing.
机译:制备了具有镍(NiJ掺杂的铟锡氧化物(ITO)阳极)的有机发光二极管(OLED),通过溅射沉积由1、3和5 wt%的Ni-ITO单靶制备了Ni掺杂的ITO阳极。镍掺杂的ITO阳极的OLED器件的开启电压分别降低了2.5、4和3.8 V(分别针对1、3和5 wt%的目标),半发光寿命提高了2.5倍。 Ni(3 wt%)-ITO单靶。通过Ni-ITO单靶溅射制备Ni掺杂的ITO膜的成功开发使该方法可用于OLED制造。

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