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Effects of a nitrogen seeded plasma on nanostructured tungsten films having fusion-relevant features

机译:氮肥血浆对具有融合相关特征的纳米结构钨膜的影响

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摘要

Nitrogen (N) seeding is routinely applied in tokamaks with tungsten (W) walls to control the power exhaust toward the divertor. Open questions, concerning the interaction of N with W, are the influence of ion energy and W temperature on retention of implanted N and the erosion by deuterium (D) of the tungsten nitride being formed. Moreover, the extremely high particle fluxes in ITER and DEMO will erode the W tiles and the sputtered atoms will re-deposit forming W-based layers with a different behaviour toward the interaction with N seeded D plasmas.In this work, W films with different morphology and structure were exposed to the N seeded D plasma of the linear device GyM, in order to address all these issues. The experiments were performed at the fixed N2/D2partial pressure ratio of~4% keeping the total pressure constant at 5.3×10?4mbar. The exposure conditions were: (i) sample temperature of~850 K, (ii) particle fluxes of2?2.2×1020ions?m?2?s?1and (iii) particle energies up to~320 eV. W columnar films (c-W) with properties close to those of virgin W coatings deposited on the tiles of JET Iter-Like Wall and ASDEX Upgrade and W amorphous films (a-W) resembling nanostructured W-based deposits found in present-day tokamaks and expected in ITER and DEMO, were considered. W columnar and amorphous coatings were produced by means of magnetron sputtering and pulsed laser deposition, respectively. The specimens were characterised by profilometry, X-ray depth-profiling photoelectron spectroscopy, optical microscopy, scanning electron microscopy, atomic force microscopy and X-ray diffraction. The main evidence is that the behaviour of the W films upon D+N plasma exposure in GyM strictly depends on their morphology and nanostructure. For all the films, a surface N-enriched layer, which is thermally stable and does not decompose at least up to~850 K, is observed. Moreover, blisters are not present on the surface of the samples. The c-W coatings erode faster than the a-W ones and have a higher nitrogen retention and diffusivity. The mechanisms behind these results are here discussed together with their possible implications from the point of view of the topic of plasma–wall interaction in tokamaks.
机译:用钨(W)壁常将氮气(N)播种用于用钨(W)壁来控制电力排放朝向转轴。关于N与W的n相互作用的打开问题是离子能量和W温度对所形成的钨氮化物的氘(D)的植入N和腐蚀的影响。此外,迭代和演示中的极高粒子通量将侵蚀W瓦片,溅射的原子将重新沉积形成与与N种子D等离子相互作用的不同行为。在这项工作中,W薄膜不同形态和结构暴露于线性器件健身房的N种子D等离子体,以解决所有这些问题。在固定的N 2 / D2分子压力比的实验中进行〜4%,保持总压力恒定在5.3×10?4mbar。暴露条件是:(i)样品温度为〜850 k,(ii)颗粒助熔剂2〜2.2×104040Ω·m?2?s?1(iii)粒子能量高达约320eV。 W柱状薄膜(CW)具有靠近涂在射流浸泡墙和Asdex升级的瓷砖瓷砖上的处女涂层和W非无形貌薄膜(AW)的属性,类似于在当前的Tokamaks和预期的被认为是迭代和演示。通过磁控溅射和脉冲激光沉积产生W柱状和非晶涂层。该样本的表征是轮廓测定法,X射线深度分析光电子能量,光学显微镜,扫描电子显微镜,原子力显微镜和X射线衍射。主要证据是,W电影在健身房中的D + N血浆暴露的行为严格取决于它们的形态和纳米结构。对于所有薄膜,观察到热稳健的表面n级层,其是热稳定的,并且不会至少分解至少高达〜850k。此外,水泡不存在于样品的表面上。 C-W涂层侵蚀比A-W更快,并且具有更高的氮保留和扩散性。这些结果背后的机制在这里讨论了从托卡马克斯的等离子壁互动的话题的角度讨论。

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