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Design and Simulation of Capacitive MEMS Switch for Ka Band Application

机译:KA频段应用的电容MEMS开关的设计与仿真

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摘要

In this paper, RF MEMS switch with capacitive contact is designed and analyzed for Ka band application. A fixed-fixed beam/meander configuration has been used to design the switch for frequency band 10?GHz to 40?GHz. Electromagnetic and electromechanical analysis of three-dimensional (3D) structure/design has been analyzed in multiple finite element method (FEM) based full-wave simulator (Coventorware and high-frequency structure simulator). A comparative study has also been carried out in this work. The high resistivity silicon substrate ( , , ) with a thickness of has been taken for switch realization. The designed structure shows an actuation voltage of around 9.2?V. Impedance matching for the switch structure is well below 20?dB, loss in upstate, i.e., insertion loss 0.5?dB, and isolation of 25?dB throughout the frequency band is observed for the aforesaid structure. Furthermore, to increase the RF parameters, AIN dielectric material has been used instead of SiO 2 resulting in capacitance in downstate that increases hence improved the isolation. The proposed switch can be utilized in various potential applications such as any switching/tunable networks phased-array radar, reconfigurable antenna, RF phase shifter, mixer, biomedical, filter, and any transmitter/receiver (T/R) modules.
机译:在本文中,RF MEMS开关设计和分析了KA频段应用。固定固定光束/曲折配置已被用于设计频带10≤j的开关10?ghz至40?ghz。三维(3D)结构/设计的电磁和机电分析已在多个有限元方法(FEM)的全波模拟器(CoventorWare和高频结构模拟器)中分析。在这项工作中也进行了比较研究。已经采用了厚度的高电阻率硅衬底(,)用于开关实现。设计的结构显示致动电压约为9.2Ωv。用于开关结构的阻抗匹配远低于20?dB,upstate的损失,即插入损耗& 0.5?db,以及在上述结构中观察到整个频段内的&25≤db。此外,为了增加RF参数,已经使用了AIN电介质材料代替SiO 2,导致下面的电容增加,从而提高了隔离。所提出的开关可以用于各种潜在的应用,例如任何开关/可调网络相控阵雷达,可重新配置的天线,RF移相器,混频器,生物医学,滤波器和任何发射机/接收器(T / R)模块。

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