Imaging Mueller matrix ellipsometry setup for optical nanoform metrology

摘要

We designed, realized, and characterised an imaging Mueller matrix ellipsometry setup for the pixelwise measurement of the Mueller matrices in microscope images. Our setup is capable of performing measurements in reflection as well as in transmission in a broad range of angles of incidence for wavelengths between 400 nm and 700 nm. We compared measurements of specially designed nanostructured samples with AFM and SEM measurements as well as with numerical simulations using the finite element method.