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首页> 外文期刊>Journal of the Ceramic Society of Japan >Interface reaction between PbTiO3 epitaxial thin films and La-doped SrTiO3 (001) substrates through edge dislocations induced by 90° domain formation
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Interface reaction between PbTiO3 epitaxial thin films and La-doped SrTiO3 (001) substrates through edge dislocations induced by 90° domain formation

机译:通过90°域形成诱导的边缘位错,PBTIO3外延薄膜和La掺杂Srtio3(001)基板之间的界面反应

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The interface structure change between PbTiOsub3/sub (PTO) thin films with various thickness grown on La-doped SrTiOsub3/sub(001) (La:STO) single crystal substrates by chemical solution deposition method was elucidated by (scanning) transmission electron microscopy ((S)TEM). The films were comprised of perovskite single phase and cube-on-cube orientation relationship with the substrate. STEM images revealed that the twin deformation precedes the nucleation of edge dislocations away from the coherent interface between the film and the substrate. Diffusion of Pb ions into the substrate was also observed through edge dislocations away from the interface. Edge dislocations climbs downward into the substrate with further diffusion of Pb ions increasing the film thickness. This phenomenon was not observed in the PTO film deposited on the non-doped STO substrate. Therefore, lattice defects in the La:STO substrate. the misfit dislocation induced by 90° domain formation as well as similar ionic radius between Pb and Sr ions appeared to facilitate the local interdiffusion of the constituent elements between the film and the substrate.
机译:通过化学溶液在La-掺杂的SRTIO 3 (La:STO)单晶基板上在具有各种厚度的PBTIO 3 (PTO)薄膜之间的界面结构改变了具有各种厚度的薄膜通过(扫描)透射电子显微镜((S)TEM)阐明沉积方法。薄膜由钙钛矿单相和与基材的立方体对立方体取向关系组成。茎图像显示,双变形在远离膜和基板之间的相干界面的边缘位错之前。通过远离界面的边缘位错也观察到PB离子扩散到基质中。边缘位错向下爬入基板中,进一步扩散Pb离子增加膜厚度。在沉积在非掺杂的STO衬底上的PTO膜中未观察到该现象。因此,LA:STO基板中的晶格缺陷。在Pb和Sr离子之间产生90°结构的错配脱位以及Pb和Sr离子之间的类似离子半径,以促进膜和基材之间的构成元件的局部相互作用。

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