首页> 外文期刊>AIP Advances >Effect of fabrication conditions on phase formation and properties of epitaxial (PbMg1/3Nb2/3O3)0.67-(PbTiO3)0.33 thin films on (001) SrTiO3
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Effect of fabrication conditions on phase formation and properties of epitaxial (PbMg1/3Nb2/3O3)0.67-(PbTiO3)0.33 thin films on (001) SrTiO3

机译:制备条件对(001)SrTiO3上外延(PbMg1 / 3Nb2 / 3O3)0.67-(PbTiO3)0.33薄膜的相形成和性能的影响

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The pulsed laser deposition process of 300nm thick films of Pb(Mg1/3Nb2/3)O3)0.67-(PbTiO3)0.33 on (001)-oriented SrTiO3 was studied by varying deposition pressure, substrate deposition temperature, laser fluence on the target and target-substrate distance. Perovskite phase pure, (001)-oriented, epitaxial smooth films were obtained in a narrow range of deposition parameters. The ferroelectric and dielectric properties of films fabricated within this parameter range still vary significantly. This shows the sensitivity of the system for growth conditions. The best film has a polarization value close to that expected for a (001) poled, stress free single crystalfilm. All films show deposition conditions dependent variations in the self-bias field. The self-bias is very stable during long cycling for films made at optimum deposition conditions. The piezoelectric coefficients of the films are strongly reduced with respect to bulk single crystal values due to the film clamping. The properties variations are ascribed to changes in the grain boundary properties in which film defects are expected to accumulate. Notably slight off-stoichiometry may cause localized screening charges, affecting specifically the polarization and dielectric constant.
机译:通过改变沉积压力,衬底沉积温度,激光对靶和靶的注量,研究了在(001)取向的SrTiO3上300nm厚的Pb(Mg1 / 3Nb2 / 3)O3)0.67-(PbTiO3)0.33厚膜的脉冲激光沉积过程。目标-底物距离。在狭窄的沉积参数范围内获得了钙钛矿相纯的(001)取向外延光滑膜。在此参数范围内制造的薄膜的铁电和介电性能仍然有很大差异。这显示了系统对生长条件的敏感性。最好的薄膜的极化值接近于(001)极化无应力单晶薄膜的极化值。所有薄膜在自偏压场中都显示出沉积条件所依赖的变化。对于在最佳沉积条件下制作的薄膜,自偏压在长时间循环中非常稳定。由于膜的夹持,膜的压电系数相对于整体单晶值大大降低。所述特性变化归因于预期将累积膜缺陷的晶界特性的变化。明显地,轻微的非化学计量比可能引起局部的筛选电荷,特别影响极化和介电常数。

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