首页> 外文期刊>International Journal of Modern Physics: Conference Series >EFFECT OF ANNEALING TEMPERATURE ON OPTICAL PROPERTIES OF TITANIUM DIOXIDE THIN FILMS PREPARED BY SOL-GEL METHOD
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EFFECT OF ANNEALING TEMPERATURE ON OPTICAL PROPERTIES OF TITANIUM DIOXIDE THIN FILMS PREPARED BY SOL-GEL METHOD

机译:退火温度对溶胶 - 凝胶法制备钛二氧化钛薄膜光学性质的影响

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TiO_(2) thin films were deposited on glass substrates by sol-gel method. Nanocrystalline TiO_(2) thin films were prepared at ambient conditions and titanium tetraisopropoxide [C_(12)H_(28)O_(4)Ti] was used as a Ti-precursor. The effect of annealing temperature on optical properties of nanocrystalline TiO_(2) thin films was studied. The as-deposited films were dried at 100 °C for 1 hr. The films formed were further heated in temperature between 200 and 500 °C for 1 hr. The films were characterized by different techniques: XRD, UV-visible spectroscopy, FTIR spectroscopy and FESEM. The characterization studies revealed that the films are crystallized as anatase phase and nano-structured with better optical properties α = 0.89 as compared to reported data. The optical measurement showed the indirect band gap between 3.31 and 3.35 eV with corresponding crystallite sizes between 8.9 and 3.7 nm. The FESEM image of film annealed at 400 °C showed spherical nanocrystalline structure of TiO_(2) particles. The crystallite sizes obtained from FESEM image are found to be between 30 and 100 nm. It is also observed that refractive index of the film increases with increasing the annealing temperature. The smaller crystallite size gives larger band gap due to quantum size effects.
机译:通过溶胶 - 凝胶法在玻璃基板上沉积TiO_(2)薄膜。在环境条件下制备纳米晶TiO_(2)薄膜,用钛四丙氧化钛[C_(12)H_(28)O_(4)Ti]用作Ti-前体。研究了退火温度对纳米晶TiO_(2)薄膜光学性质的影响。将沉积的薄膜在100℃下干燥1小时。形成的薄膜在200至500℃的温度下进一步加热1小时。该薄膜的特征在于不同的技术:XRD,UV可见光谱,FTIR光谱和FESEM。表征研究表明,与报告的数据相比,薄膜用锐钛矿相和纳米结构α= 0.89结晶。光学测量显示3.31和3.35eV之间的间接带差距,相应的微晶尺寸在8.9和3.7nm之间。在400℃下退火的薄膜的FeSEM图像显示TiO_(2)颗粒的球形纳米晶体结构。发现从FESEM图像获得的微晶尺寸在30到100nm之间。还观察到,随着退火温度的增加,膜的折射率增加。较小的微晶尺寸由于量子尺寸效应而产生较大的带隙。

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