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Enhancement of photoluminescence efficiency in GeSe ultrathin slab by thermal treatment and annealing: experiment and first-principles molecular dynamics simulations

机译:热处理和退火的GESE超薄板中光致发光效率的增强:实验与第一原理分子动力学模拟

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The effect of thermal treatment and annealing under different temperatures from 100?°C to 250?°C on the photoluminescence spectroscopy of the GeSe ultrathin slab is reported. After the thermal treatment and annealing under 200?°C, we found that the photoluminescence intensity of A exciton and B exciton in GeSe ultrathin slab is increased to twice as much as that in untreated case, while is increased by ~84% in the photoluminescence intensity of C exciton. Combined by our experimental work and theoretical simulations, our study confirms the significant role of thermal treatments and annealing in reducing surface roughness and removing the Se vacancy to form more compact and smoother regions in GeSe ultrathin slab. Our findings imply that the improved quality of GeSe surface after thermal treatments is an important factor for the photoluminescence enhancement.
机译:报道了热处理和退火在不同温度下的影响,从100Ω℃到250℃的GESE超薄板坯的光致发光光谱法。在200℃下的热处理和退火之后,我们发现,GESE超薄板中的激子和B个激子的光致发光强度增加到未处理案例中的两倍,而光致发光在显着增加〜84% C激子的强度。通过我们的实验工作和理论模拟,我们的研究证实了热处理和退火在降低表面粗糙度下的显着作用,并除去了GESE超薄板中的空位以形成更紧凑和更平滑的地区。我们的研究结果意味着热处理后GESE表面的提高质量是光致发光增强的重要因素。

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