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Enhancement of photoluminescence efficiency in GeSe ultrathin slab by thermal treatment and annealing: experiment and first-principles molecular dynamics simulations

机译:通过热处理和退火提高GeSe超薄板的光致发光效率:实验和第一性原理分子动力学模拟

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摘要

The effect of thermal treatment and annealing under different temperatures from 100 °C to 250 °C on the photoluminescence spectroscopy of the GeSe ultrathin slab is reported. After the thermal treatment and annealing under 200 °C, we found that the photoluminescence intensity of A exciton and B exciton in GeSe ultrathin slab is increased to twice as much as that in untreated case, while is increased by ~84% in the photoluminescence intensity of C exciton. Combined by our experimental work and theoretical simulations, our study confirms the significant role of thermal treatments and annealing in reducing surface roughness and removing the Se vacancy to form more compact and smoother regions in GeSe ultrathin slab. Our findings imply that the improved quality of GeSe surface after thermal treatments is an important factor for the photoluminescence enhancement.
机译:报道了在100°C至250°C的不同温度下进行热处理和退火对GeSe超薄板的光致发光光谱的影响。经过200°C的热处理和退火后,我们发现GeSe超薄平板中A激子和B激子的光致发光强度增加到未处理情况的两倍,而光致发光强度则增加了约84% C激子结合我们的实验工作和理论模拟,我们的研究证实了热处理和退火在降低表面粗糙度和消除硒空位以在GeSe超薄板中形成更致密和更光滑区域方面的重要作用。我们的发现表明,热处理后GeSe表面质量的改善是增强光致发光的重要因素。

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