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Effect of thermal annealing on dynamics of photoluminescence in a-GeSe2 films

机译:热退火对a-GeSe2薄膜中光致发光动力学的影响

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We have investigated the effect of thermal annealing on dynamics of photoluminescence (PL) in vacuum-evaporated a-GeSe2 films with thickness of 15 mu m. The intensity of PL increases over 200 times after annealing at 250 degrees C, which makes it possible to take a first investigation on both decay time and fatigue effect. The disordered amorphous structure of the a-GeSe2 film, containing wrong bonds, Ge-Ge and Se-Se, has been reconstructed to a stable structure by diminishing the number of the wrong bonds and the related strain or internal pressure by thermal annealing. (C) 2000 Elsevier Science B.V. All rights reserved. [References: 7]
机译:我们已经研究了热退火对厚度为15μm的真空蒸发a-GeSe2薄膜中光致发光(PL)动力学的影响。在250摄氏度下退火后,PL的强度增加了200倍以上,这使得可以对衰减时间和疲劳效应进行初步研究。通过减少错误键的数量和通过热退火产生的相关应变或内部压力,已将包含错误键Ge-Ge和Se-Se的a-GeSe2薄膜的无序非晶结构重构为稳定的结构。 (C)2000 Elsevier Science B.V.保留所有权利。 [参考:7]

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