High Resolution Patterning of Functional Inks using Wettability and Repellency Control Method and Its Application to Electronic Devices

摘要

High performance and easily processable wettable/repellent patterns formation were achieved using photo-induced surface control materials (PISC) by conventional i-line exposure and annealing. Functional inks can be patterned spontaneously on exposed surface which realize high resolution patterning by drop-coating methods. Fine silver lines of 10-μm width were achieved by inkjet printing with Ag nanoparticle (AgNP) inks on this pattern. Using this technique, silver source-drain electrodes of organic thin film transistor (OTFT) were successfully fabricated. A novel patterning method using alkali-developable type PISC was also devised for formation of high resolution, aspect patterns and high thickness microlenses, which difficult to be formed by photolithography technique.