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首页> 外文期刊>Scientific reports. >UV sensing using film bulk acoustic resonators based on Au-ZnO/piezoelectric-ZnO/Al structure
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UV sensing using film bulk acoustic resonators based on Au-ZnO/piezoelectric-ZnO/Al structure

机译:使用基于Au / n-ZnO /压电-ZnO / Al结构的薄膜压电谐振器进行UV感测

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A new type of ultraviolet (UV) light sensor based on film bulk acoustic wave resonator (FBAR) is proposed. The new sensor uses gold and a thin n-type ZnO layer deposited on the top of piezoelectric layer of FBAR to form a Schottky barrier. The Schottky barrier's capacitance can be changed with UV light, resulting in an enhanced shift in the entire FBAR's resonant frequency. The fabricated UV sensor has a 50?nm thick n-ZnO semiconductor layer with a carrier concentration of ~ 1017?cm?3. A large frequency downshift is observed when UV light irradiates the FBAR. With 365?nm UV light of intensity 1.7?mW/cm2, the FBAR with n-ZnO/Au Schottky diode has 250?kHz frequency downshift, much larger than the 60?kHz frequency downshift in a conventional FBAR without the n-ZnO layer. The shift in the new FBAR's resonant frequency is due to the junction formed between Au and n-ZnO semiconductor and its properties changes with UV light. The experimental results are in agreement with the theoretical analysis using an equivalent circuit model of the new FBAR structure.
机译:提出了一种基于薄膜体声波谐振器(FBAR)的新型紫外光传感器。新型传感器使用金和沉积在FBAR压电层顶部的薄n型ZnO层形成肖特基势垒。肖特基势垒的电容可以通过紫外线来改变,从而导致整个FBAR谐振频率的偏移增加。制成的紫外线传感器具有50?nm厚的n-ZnO半导体层,其载流子浓度约为10 17 ?cm ?3 。当紫外线照射FBAR时,观察到较大的频率降档。在365?nm紫外线强度为1.7?mW / cm 2 的情况下,具有n-ZnO / Au肖特基二极管的FBAR的频率下移为250?kHz,远大于60?kHz的频率下移。没有n-ZnO层的常规FBAR。新的FBAR谐振频率的偏移是由于Au和n-ZnO半导体之间形成的结,其特性随紫外光而变化。实验结果与使用新FBAR结构的等效电路模型的理论分析一致。

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