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Influence of Interconfigurational Electronic States on Fe, Co, Ni-Silicene Materials Selection for Spintronics

机译:互构电子态对自旋电子学中Fe,Co,Ni-Silicene材料选择的影响

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Growth through controlled adsorption of ferromagnetic elements such as Fe, Co and Ni on two-dimensional silicene provides an alternative route for silicon-based spintronics. Plane wave DFT calculations show that Fe, Co and Ni adatoms are strongly chemisorbed via strong sigma bonds, with adsorption energies (1.55 - 2.29?eV) that are two to six times greater compared to adsorption on graphene. All adatoms adsorb more strongly at the hole site than at the atom site, with Ni adsorbing strongest. Of the dimer configurations investigated, the hole – hole, b-atom – hole, vertically stacked at hole, vertically stacked at b-atom and bridge sites were found to be stable. The Co and Ni dimers are most stable when adsorbed in the hole-hole configuration while the Fe dimer is most stable when adsorbed in the atom-hole configuration. Metal-to-silicene and interconfigurational s-to-d electron transfer processes underpin the trends observed in adsorption energies and magnetic moments for both adatoms and dimers. Adsorption of these metals induces a small band gap at the Dirac Cone. In particular Co adatom adsorption at the hole site induces the largest spin-polarized band gaps of 0.70?eV (spin-up) and 0.28?eV (spin-down) making it a potential material candidate for spintronics applications.
机译:通过控制铁磁元素(例如Fe,Co和Ni)在二维硅上的吸附生长,为硅基自旋电子学提供了另一种途径。平面波DFT计算表明,Fe,Co和Ni原子通过强σ键被强力化学吸附,其吸附能(1.55-2.29?eV)比石墨烯上的吸附能高2至6倍。所有吸附原子在空穴位置的吸附均比原子位置的吸附强,其中镍的吸附最强。在所研究的二聚体构型中,发现孔–孔,b原子–孔,垂直堆叠在孔处,垂直堆叠在b原子和桥位处是稳定的。当以孔-孔构型吸附时,Co和Ni二聚体最稳定,而以原子-孔构型吸附时,Fe二聚体最稳定。金属到硅酮和互构的s到d的电子转移过程支撑着吸附原子和二聚体的吸附能和磁矩的趋势。这些金属的吸附会在狄拉克锥上产生一个小的带隙。特别是在孔位处的Co吸附原子吸附会导致最大的自旋极化带隙为0.70?eV(向上旋转)和0.28?eV(向下旋转),使其成为自旋电子学应用的潜在材料候选。

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