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首页> 外文期刊>Scientific reports. >Quantitative Imaging of Rapidly Decaying Evanescent Fields Using Plasmonic Near-Field Scanning Optical Microscopy
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Quantitative Imaging of Rapidly Decaying Evanescent Fields Using Plasmonic Near-Field Scanning Optical Microscopy

机译:使用等离子体近场扫描光学显微镜对快速衰减的瞬逝场进行定量成像

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Non-propagating evanescent fields play an important role in the development of nano-photonic devices. While detecting the evanescent fields in far-field can be accomplished by coupling it to the propagating waves, in practice they are measured in the presence of unwanted propagating background components. It leads to a poor signal-to-noise ratio and thus to errors in quantitative analysis of the local evanescent fields. Here we report on a plasmonic near-field scanning optical microscopy (p-NSOM) technique that incorporates a nanofocusing probe for adiabatic focusing of propagating surface plasmon polaritons at the probe apex, and for enhanced coupling of evanescent waves to the far-field. In addition, a harmonic demodulation technique is employed to suppress the contribution of the background. Our experimental results show strong evidence of background free near-field imaging using the new p-NSOM technique. Furthermore, we present measurements of surface plasmon cavity modes, and quantify their contributing sources using an analytical model.
机译:非传播的van逝场在纳米光子器件的开发中起着重要作用。在远场中检测the逝场可以通过将其耦合到传播波上来实现,但实际上,它们是在存在不需要的传播背景分量的情况下进行测量的。这将导致较差的信噪比,从而导致对局部渐逝场进行定量分析时出现错误。在这里,我们报告了等离子体近场扫描光学显微镜(p-NSOM)技术,该技术结合了纳米聚焦探针,用于在探针顶点处传播表面等离子体激元极化子的绝热聚焦,以及使enhanced逝波与远场增强耦合。另外,采用谐波解调技术来抑制背景的影响。我们的实验结果显示了使用新型p-NSOM技术进行无背景近场成像的有力证据。此外,我们介绍了表面等离激元腔模的测量,并使用分析模型量化了它们的贡献来源。

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