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APS -APS March Meeting 2017 - Event - Optimizing electrical conductivity and optical transparency of IZO thin film deposited by radio frequency (RF) magnetron sputtering

机译:APS -APS 2017年3月会议-活动-优化通过射频(RF)磁控溅射沉积的IZO薄膜的电导率和光学透明度

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Transparent conducting oxide (TCO) thin films of In2O3, SnO2, ZnO, and their mixtures have been extensively used in optoelectronic applications such as transparent electrodes in solar photovoltaic devices. In this project I deposited amorphous indium--zinc oxide (IZO) thin films by radio frequency (RF) magnetron sputtering from a In2O3--10 wt.{%} ZnO sintered ceramic target to optimize the RF power, argon gas flowing rate, and the thickness of film to reach the maximum conductivity and transparency in visible spectrum. The results indicated optimized conductivity and transparency of IZO thin film is closer to ITO's conductivity and transparency, and is even better when the film was deposited with one specific tilted angle.
机译:In2O3,SnO2,ZnO及其混合物的透明导电氧化物(TCO)薄膜已广泛用于光电应用,例如太阳能光伏设备中的透明电极。在该项目中,我通过射频(RF)磁控溅射从In2O3--10 wt。{%} ZnO烧结陶瓷靶中沉积了非晶态铟锌氧化物(IZO)薄膜,以优化RF功率,氩气流速,并使薄膜的厚度达到可见光谱中的最大电导率和透明度。结果表明,IZO薄膜的最佳电导率和透明度接近于ITO的电导率和透明度,并且当以一个特定的倾斜角度沉积薄膜时甚至更好。

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