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Diffusion of tellurium at nickel grain boundaries: a first-principles study

机译:碲在镍晶界的扩散:一项第一性原理研究

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The knowledge of the behavior of Te in nickel grain boundaries (GB) is of significant importance for the application of nickel alloys in molten salt reactors. The atomic structures, stabilities, segregation behaviors and diffusion barriers of Te are studied for the bulk, surfaces and four kinds of GBs of nickel. Our first-principles calculations indicate the segregation of Te is most favorable at Σ = 5 (021) GB and the weakest at Σ = 3 (111) GB. The diffusion barriers of Te increase in sequence: Σ = 11 (11), Σ = 9 (221), Σ = 3 (111) and Σ = 5 (021). The calculated diffusion barrier of Te on Σ = 11 (11) is 0.35 eV lower than in the bulk, indicating a fast diffusion of Te along this GB. We also consider the effect of strain on the diffusion and find it to be sensitive to the different GB types. When the tensile strain is up to 4%, the diffusion barriers of Te are lowered by 0.51 eV and 0.15 eV for Σ = 5 (021) and Σ = 11 (11), respectively. In contrast, this effect for Σ = 3 (111) is negligible.
机译:Te在镍晶界(GB)中的行为知识对于在熔盐反应堆中应用镍合金具有重要意义。研究了镍的体积,表面和四种GBs的Te的原子结构,稳定性,偏析行为和扩散势垒。我们的第一性原理计算表明,Te的偏析在Σ = 5(021)GB时最有利,而在Σ = 3(111)GB时最弱。 Te的扩散势垒依次增加:Σ = 11(11),Σ = 9(221),Σ = 3(111)和Σ = 5(021)。计算得出的Te在Σ = 11(11)上的扩散势垒比在主体中低0.35 eV,表明Te沿该GB快速扩散。我们还考虑了应变对扩散的影响,并发现它对不同的GB类型敏感。当拉伸应变高达4%时,当Σ = 5(021)和Σ = 11(11)时,Te的扩散势垒降低0.51 eV和0.15 eV ), 分别。相反,对于Σ = 3(111)的影响可忽略不计。

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