首页> 外文期刊>International Journal of Engineering Research and Applications >Modeling and Estimation of Total Leakage Current in Nano-scaled 7T SRAM Cell Considering the Effect of Parameter Variation
【24h】

Modeling and Estimation of Total Leakage Current in Nano-scaled 7T SRAM Cell Considering the Effect of Parameter Variation

机译:考虑参数变化影响的纳米级7T SRAM单元总漏电流的建模与估计

获取原文
       

摘要

In this paper we have modeled and estimated the gate leakage , the sub threshold, and the total leakage in nano scaled 7T SRAM cell by considering variation in process parameters like transistor width, oxide thickness. We have verified the results using an NMOS device of 45nm effective length and analyzed the results to enumerate the effect of different process parameters on the individual components and the total leakage. The identification and modeling of different leakage components is very important for estimation and reduction of leakage power, especially for low-power applications. This research evaluates various leakage components with parameter variation effects in 7T SRAM cell at the 45nm technology node using Cadence tool with 0.7 supply voltage . The primary contribution of this work is to estimate and modeled gate leakage, sub threshold leakage and total leakage of 7T SRAM cell by considering the effects of parameter variation. Keywords:
机译:在本文中,我们通过考虑晶体管宽度,氧化物厚度等工艺参数的变化,对纳米级7T SRAM单元的栅极泄漏,子阈值和总泄漏进行了建模和估算。我们已经使用有效长度为45nm的NMOS器件验证了结果,并分析了结果以枚举不同工艺参数对单个组件和总泄漏的影响。对于泄漏功率的估计和降低,特别是对于低功率应用,不同泄漏组件的识别和建模非常重要。本研究使用0.7电源电压的Cadence工具对45nm工艺节点的7T SRAM单元中具有参数变化效应的各种泄漏成分进行了评估。这项工作的主要贡献是通过考虑参数变化的影响来估计和建模7T SRAM单元的栅极泄漏,亚阈值泄漏和总泄漏。关键字:

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号