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首页> 外文期刊>Journal of the Ceramic Society of Japan >Characterization of La-doped YBCO superconducting films deposited by DC magnetron sputtering at various off-axis geometries
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Characterization of La-doped YBCO superconducting films deposited by DC magnetron sputtering at various off-axis geometries

机译:直流磁控溅射沉积的La掺杂YBCO超导膜在不同轴外几何尺寸处的表征

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摘要

La-doped YBCO (Y0.9La0.2Ba1.9Cu3O y ) superconducting films were deposited by an off-axis DC magnetron sputtering method. We investigated the relationship between the film characteristics and the deposition conditions, and drew systematical maps in terms of composition, surface morphology, crystal structure and superconducting properties for the films deposited at various spatial geometries of a substrate and a target. Correspondence between the Cu content and the surface morphology was clearly observed. Cu-rich films had precipitates on the surface. Slightly Cu-poor films exhibited c -axis orientation and a high T c of 87 K. Among them, the film deposited at a rather fast deposition rate exhibited a flat surface with an average surface roughness R a less than 1 nm for an area of 10 micron square. Considerably Cu-poor films contained a -axis oriented grains or exhibited very rough surfaces. The cationic ratio of Y:La:Ba did not change significantly.
机译:掺杂La的YBCO(Y 0.9 La 0.2 Ba 1.9 Cu 3 O y 用离轴直流磁控溅射法沉积超导膜。我们研究了薄膜特性与沉积条件之间的关系,并针对在基材和靶材的各种空间几何形状上沉积的薄膜在组成,表面形态,晶体结构和超导特性方面绘制了系统图。清楚地观察到Cu含量与表面形态之间的对应关系。富铜膜在表面上有沉淀。贫铜薄膜具有c轴取向和87 K的高T c 。其中,以较快的沉积速率沉积的薄膜呈现出平坦的表面,平均表面粗糙度R a 小于1 nm,面积为10微米见方。贫铜薄膜中含有大量取向的晶粒或表面非常粗糙。 Y:La:Ba的阳离子比没有明显变化。

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