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首页> 外文期刊>Journal of the Ceramic Society of Japan >Temperature dependence of the electrical and electromechanical properties of Ba(Zr0.2Ti0.8)O3 thin films prepared by chemical solution deposition
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Temperature dependence of the electrical and electromechanical properties of Ba(Zr0.2Ti0.8)O3 thin films prepared by chemical solution deposition

机译:化学溶液沉积法制备Ba(Zr0.2Ti0.8)O3薄膜的机电性能与温度的关系

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摘要

Thin films of Ba(Zr0.2Ti0.8)O3 (BZT) were prepared on Pt/Ti/SiO2/Si and Pt/TiOx/SiO2/Si substrates by chemical solution deposition. The alkoxide–hydroxide method was applied. The temperature dependence of the electrical and electromechanical properties of the BZT thin films was investigated. Application of a Pt/TiOx/SiO2/Si substrate is effective in suppressing the unknown phase formation and in obtaining high permittivity of 1080 and tunability under 400 kV/cm of 84%. The XPS depth profile reveals that titanium and oxygen are richly present close to the BZT/Pt interface of the films on a Pt/TiOx/SiO2/Si substrate. The temperature dependences of permittivity, tunability and field-induced strain are slight between ?100°C and 100°C. The piezoelectric coefficient at room temperature estimated from the slope of the displacement loop is 35 pm/V.
机译:在Pt / Ti / SiO 2 上制备了Ba(Zr 0.2 Ti 0.8 )O 3 (BZT)薄膜。化学溶液沉积法制备sub> / Si和Pt / TiOx / SiO 2 / Si衬底。采用了醇盐-氢氧化物方法。研究了BZT薄膜的电和机电性能的温度依赖性。 Pt / TiOx / SiO 2 / Si基板的应用可有效抑制未知相的形成,并获得高介电常数1080和400 kV / cm下84%的可调谐性。 XPS深度剖面表明,在Pt / TiOx / SiO 2 / Si衬底上,薄膜的BZT / Pt界面附近富含钛和氧。介电常数,可调谐性和场致应变的温度相关性在100°C至100°C之间很小。根据位移环的斜率估算的室温下的压电系数为35 pm / V。

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