Laser-dry-etching method has attracted a great deal of interest in industry because of the many potential benefits such as enormous cost reduction and chemical-free manufacturing environment. The authors have been developing various laser-dry-etching systems for large-scale Flat panel displays (FPDs). All these systems try to balance between etching speed and etching quality. It is crucial to have high-quality processes in the mass production lines, which operate 7 days per week, 24 hours per day. In this paper, the etching qualities of liquid crystal displays (LCDs) that are the representative of FPDs are outlined. Especially in laser-dry-etching for color filter (CF) substrate of LCD, the selective removal of indium tin oxide (ITO) films at black matrix (BM) position is much more difficult than at other positions. The authors have developed a new etching method so called "grazing incidence method with laser-dry-etching (GI-LDE)". The selective removal of ITO films at black matrix position has become possible by using this method.
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