首页> 外文期刊>Journal of Laser Micro/Nanoengineering >Utilizing Fundamental Beam-Mode Shaping Technique for Top-Hat La-ser Intensities in Direct Laser Interference Patterning
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Utilizing Fundamental Beam-Mode Shaping Technique for Top-Hat La-ser Intensities in Direct Laser Interference Patterning

机译:在直接激光干涉图案化中利用基本光束模式整形技术处理顶帽子激光强度

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In this work, a diffractive fundamental beam-mode shaper (FBS) element is combined with a Direct Laser Interference Patterning (DLIP) optical setup to generate a square-shaped top-hat inten-sity distribution in the interference volume. The interference patterns produced by a symmetrical 4-beam DLIP setup with Gaussian and Flat-top intensity distributions are measured and characterized. The impact of misalignments in the optical setup on the resulting intensity profile is analyzed and supplemented by theoretical calculations of the distorted interference patterns. Finally, top-hat shaped interference patterns can be introduced and utilized in order to generate surface patterns with improved homogeneity which eventually will lead to an improved performance in applications with functionalized surfaces.
机译:在这项工作中,将衍射基本光束模式整形器(FBS)元素与直接激光干涉图案(DLIP)光学设置相结合,以在干涉体积中生成方形礼帽强度分布。测量和表征由具有高斯和平顶强度分布的对称4束DLIP设置产生的干涉图样。分析了光学装置中的未对准对所得强度分布的影响,并通过对畸变的干涉图样进行理论计算来进行补充。最后,可以引入并利用大礼帽形干涉图案,以产生具有改善的均匀性的表面图案,这最终将导致在具有功能化表面的应用中改善性能。

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