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Numerical analysis of in-flight particles in plasma jet with an externally applied magnetic field

机译:外部施加磁场的等离子体射流中飞行中粒子的数值分析

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In this work, three-dimensional, time-dependent magnetohydrodynamic (MHD) simulations of a direct-current (dc) plasma spray with an externally applied magnetic field are performed, and also the trajectories and heating histories of in-flight particles in a plasma spray jet are analyzed by Lagrangian method with one-way coupling between particle and plasma jet. The working gas is pure argon (Ar) and the material of in-flight particles is zirconium dioxide (ZrO_(2)). The representative values of operating current and magnetic flux density of externally applied magnetic field in this work are 350 A and 0.8 T, respectively. Numerical results obtained in the MHD simulation demonstrate that the use of externally applied magnetic field yields the rotation of the arc root on the anode. This rotation generates a plasma jet with a swirling component. Furthermore, it is shown from the numerical results that applying the magnetic field increases the operating voltage and thus boosts an amount of input power compared to the one without applying it. The analytical results of in-flight particles suggest that the impact positions of in-flight particles on the substrate in the case with the externally applied magnetic field change temporally due to the swirling component of the plasma jet, even when the injected position of particles is fixed. However, the utilization of externally applied magnetic field enhances heat transfer to particles, which leads to impacting of particles on substrate with well-molten state because of higher enthalpy plasma jet.
机译:在这项工作中,在外部施加磁场的情况下,对直流(dc)等离子喷雾进行了三维,随时间变化的磁流体动力学(MHD)模拟,并且还研究了等离子体中飞行中粒子的轨迹和加热历史采用拉格朗日法对粒子束和等离子体束之间的单向耦合进行了分析。工作气体为纯氩(Ar),飞行中的颗粒材料为二氧化锆(ZrO_(2))。在这项工作中,工作电流和外部施加磁场的磁通密度的代表值分别为350 A和0.8T。在MHD模拟中获得的数值结果表明,使用外部施加的磁场会使阳极上的电弧根旋转。该旋转产生具有回旋分量的等离子体射流。此外,从数值结果可以看出,与不施加磁场的情况相比,施加磁场会增加工作电压,从而提高输入功率。飞行中粒子的分析结果表明,在外部施加磁场的情况下,飞行中粒子在基板上的撞击位置由于等离子流的涡旋分量而随时间发生变化,即使粒子的注入位置为固定。然而,利用外部施加的磁场增强了向颗粒的热传递,这由于较高的焓等离子体射流而导致颗粒以良好熔融状态冲击在基材上。

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