Patterned Self-Assembly of Fine Particles and Its Application to Polishing Tool

摘要

This study aims to discuss an application of self-assembled particles to a polishing tool. Self-assembly of fine particles is obtained by drying colloidal suspension on a substrate. Using a dispenser and a motored stage, an assembly can be obtained along specific profile like spiral. The assemblies are transferred to another substrate on which ultraviolet curing resin is spin-coated and cured while pressing the substrate each other. Silica particles of 1 μm diameter were assembled over 10mm square and applied to polishing to evaluate the performance. It was found that the glass plate was polished with smooth finish. However, the particles dropped off under severe conditions.