The electroplating technique is especially interesting due to its low cost, high throughput and high quality of deposit. Magnetic thin films are extensively used in various electronic devices including high-density recording media and micro electro-mechanical (MEMS) devices. Due to these potential applications, deposition of magnetic fiolm draws special attention and it needs a cost-effective process. Electro-deposition being cost-effective, in the present work cobalt-based magnetic films were deposited electro-chemically and deposition characteristics were studied. Effect of concentration of organic additives such as urea and thiourea in the presence of sodium hypophosphite was studied. Surface characterisation was carried out using X-ray diffractometer (XRD) and scanning electron microscope (SEM). Elemental compositions of the films were studied using atomic absorption spectrometer (AAS) and showed phosphorous content was less than 1%. Samples were subjected to vibrating sample magnetometer (VSM) and studies showed that organic additive has altered magnetic properties of these films. The reason for change in magnetic properties and structural characteristics because of the additives were discussed. Mechanical properties such as residual stress, hardness and adhesion of the films were also examined and reported.
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