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首页> 外文期刊>Physical Review. Accelerators and Beams >Improving Touschek lifetime in ultralow-emittance lattices through systematic application of successive closed vertical dispersion bumps
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Improving Touschek lifetime in ultralow-emittance lattices through systematic application of successive closed vertical dispersion bumps

机译:通过系统地应用连续闭合的垂直色散凸点来改善超低发射晶格中的Touschek寿命

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In present ultralow-emittance storage ring designs the emittance coupling required for the production of vertically diffraction-limited synchrotron radiation in the hard x-ray regime is achieved and in many cases surpassed by a correction of the orbit and the linear optics alone. However, operating with a vertical emittance lower than required is disadvantageous, since it decreases Touschek lifetime and reduces brightness due to the transverse emittance increase from intrabeam scattering. In this paper we present a scheme consisting of closed vertical dispersion bumps successively excited in each arc of the storage ring by skew quadrupoles that couple horizontal dispersion into the vertical plane to a desired level and thereby raise the vertical emittance in a controlled fashion. A systematic approach to vertical dispersion bumps has been developed that suppresses dispersion and betatron coupling in the straight sections in order to maintain a small projected emittance for insertion devices. In this way, beam lifetime can be significantly increased without negatively impacting insertion device source properties and hence brightness. Using simulation results for the MAX IV 3 GeV storage ring including magnet and alignment imperfections we demonstrate that Touschek lifetime can be increased by more than a factor 2 by adjusting the vertical emittance from 1.3 pm rad (after orbit correction) to 8 pm rad (after application of dispersion bumps) using two to three independent skew quadrupole families all the while ensuring deviations from design optics are restrained to a minimum.
机译:在当前的超低发射率存储环设计中,实现了在硬X射线条件下产生垂直衍射限制的同步加速器辐射所需的发射耦合,并且在许多情况下,仅通过校正轨道和线性光学就可以超越发射耦合。但是,以低于所需的垂直发射率进行操作是不利的,因为它会降低Touschek寿命并由于光束内散射引起的横向发射率增加而降低亮度。在本文中,我们提出了一种方案,该方案由倾斜的四极杆在存储环的每个弧中连续激发闭合的垂直色散凸点组成,这些四极杆将水平色散耦合到垂直平面中达到所需水平,从而以受控方式提高垂直发射率。已经开发出一种用于垂直分散凸块的系统方法,该方法可以抑制笔直部分中的分散和电子感应加速器耦合,以便为插入设备保持较小的投影发射率。以此方式,可以在不负面影响插入装置的源特性以及因此而对亮度造成负面影响的情况下,显着地增加光束寿命。利用包括磁铁和对准缺陷在内的MAX IV 3 GeV储能环的仿真结果,我们证明了通过将垂直发射率从1.3 pm rad(经过轨道校正)调整为8 pm rad(经过校正)后,Touschek的寿命可以增加2倍以上。始终使用两个到三个独立的偏斜四极杆系列,同时确保将与设计光学器件的偏差限制到最小。

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