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Electrochemical investigation and capacitance properties of a novel electrodeposited ordered mesoporous cobalt hydroxide films

机译:新型电沉积有序介孔氢氧化钴薄膜的电化学研究和电容性质

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The present work explored a novel, simple and low cost electrochemical route for the investigation of ordered mesoporous cobalt hydroxide films electrodeposited onto gold substrate from cobalt acetate in pluronic lyotropic liquid crystal (P84). This method produces thin films of cobalt hyhdroxid mesostructures on gold substrate by combination of potentiostatic and voltammetric electrodeposition techniques. The prepared nanomaterials were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and x-ray diffraction (XRD). Electrochemical capacitance properties of cobalt hydroxide films were evaluated via cyclic voltammetry method. The film showed maximum specific capacitance of 727 F/g in 1 M sodium hydroxide electrolyte at scan rate of 5 mV/s. This indicates the potential application of cobalt films in electrochemical supercapacitors.
机译:本工作探索了一种新颖,简单且低成本的电化学途径,用于研究在普鲁尼克溶致液晶(P84)中从醋酸钴电沉积到金基底上的有序介孔氢氧化钴膜。该方法通过恒电位和伏安电沉积技术的结合在金基底上产生钴羟基氧化物介观结构的薄膜。通过扫描电子显微镜(SEM),透射电子显微镜(TEM)和X射线衍射(XRD)对制备的纳米材料进行了表征。通过循环伏安法评估氢氧化钴膜的电化学电容性能。该膜在1 m氢氧化钠电解质中以5 mV / s的扫描速率显示出最大比电容727 F / g。这表明钴膜在电化学超级电容器中的潜在应用。

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