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首页> 外文期刊>Electrochimica Acta >Effects of the electrodeposition potential and temperature on the electrochemical capacitance behavior of ordered mesoporous cobalt hydroxide films
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Effects of the electrodeposition potential and temperature on the electrochemical capacitance behavior of ordered mesoporous cobalt hydroxide films

机译:电沉积电势和温度对有序介孔氢氧化钴薄膜电化学电容行为的影响

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摘要

Novel ordered mesoporous cobalt hydroxide film (designated H{sub}1-e Co(OH){sub}2) has been successfully electrodeposited from cobalt nitrate dissolved in the aqueous domains of the hexagonal lyotropic liquid crystalline phase of Brij 56. Experimental electrodeposition parameters such as deposition potentials and deposition temperatures are varied to analyze their influences on the electrochemical capacitor behavior. The films are physically characterized by scanning electron microscopy (SEM) and transmission electron microscopy (TEM) to determine the effects of deposition potentials and temperatures on the surface morphology and nanostructure. Electrochemical techniques such as cyclic voltammetry (CV) and chronopotentiometry are applied to systematically investigate the effects of deposition potentials and temperatures on the capacitance of the films. The results demonstrated that the capacitive performance of the H{sub}1-e Co(OH){sub}2 film achieved the highest value when it is electrodeposited at -0.75 V under the deposition temperature of 50℃.
机译:新型有序介孔氢氧化钴薄膜(命名为H {sub} 1-e Co(OH){sub} 2)已成功从溶解在Brij 56六方溶致液晶相水域中的硝酸钴中电沉积。实验电沉积参数例如沉积电势和沉积温度的变化,以分析它们对电化学电容器性能的影响。通过扫描电子显微镜(SEM)和透射电子显微镜(TEM)对薄膜进行物理表征,以确定沉积电势和温度对表面形态和纳米结构的影响。电化学技术(例如循环伏安法(CV)和计时电位法)用于系统研究沉积电位和温度对薄膜电容的影响。结果表明,在50℃的沉积温度下,H {sub} 1-e Co(OH){sub} 2薄膜在-0.75 V下电沉积时,其电容性能达到最大值。

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