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首页> 外文期刊>Science and technology of advanced materials >Properties of epitaxial, (001)- and (110)-oriented (PbMg1/3Nb2/3O3)2/3-(PbTiO3)1/3 films on silicon described by polarization rotation
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Properties of epitaxial, (001)- and (110)-oriented (PbMg1/3Nb2/3O3)2/3-(PbTiO3)1/3 films on silicon described by polarization rotation

机译:(001)和(110)取向(PbMg 1/3 Nb 2/3 O 3 )外延的性质极化旋转描述硅上2/3 -(PbTiO 3 1/3 薄膜

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Epitaxial (PbMg1/3Nb2/3O3)2/3-(PbTiO3)1/3 (PMN-PT) films with different out-of-plane orientations were prepared using a CeO2/yttria stabilized ZrO2 bilayer buffer and symmetric SrRuO3 electrodes on silicon substrates by pulsed laser deposition. The orientation of the SrRuO3 bottom electrode, either (110) or (001), was controlled by the deposition conditions and the subsequent PMN-PT layer followed the orientation of the bottom electrode. The ferroelectric, dielectric and piezoelectric properties of the (SrRuO3/PMN-PT/SrRuO3) ferroelectric capacitors exhibit orientation dependence. The properties of the films are explained in terms of a model based on polarization rotation. At low applied fields domain switching dominates the polarization change. The model indicates that polarization rotation is easier in the (110) film, which is ascribed to a smaller effect of the clamping on the shearing of the pseudo-cubic unit cell compared to the (001) case.
机译:外延(PbMg 1/3 Nb 2/3 O 3 2/3 -(PbTiO 使用CeO 2 /氧化钇稳定的ZrO 制备具有不同面外取向的3 1/3 (PMN-PT)膜通过脉冲激光沉积在硅基板上形成2 双层缓冲液和对称的SrRuO 3 电极。通过沉积条件控制(110)或(001)的SrRuO 3 底电极的取向,随后的PMN-PT层遵循底电极的取向。 (SrRuO 3 / PMN-PT / SrRuO 3 )铁电电容器的铁电,介电和压电性能表现出方向依赖性。根据基于偏振旋转的模型来解释膜的特性。在较低的应用场中,域切换控制极化变化。该模型表明,在(110)膜中极化旋转更容易,这是由于与(001)情况相比,夹持对伪立方晶胞剪切的影响较小。

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