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Study of argon ions density and electron temperature and density in magnetron plasma by optical emission spectroscopy and collisional-radiative model

机译:利用光发射光谱和碰撞辐射模型研究磁控等离子体中氩离子密度和电子温度及密度

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Abstract Optical emission spectroscopy (OES) combined with the models of plasma light emission becomes non-intrusive and versatile method of plasma parameters determination. In this paper we have studied the densities of charge carriers and electron temperature in Ar plasma of pulsed {DC} magnetron in different experimental conditions. Electron density and temperature were determined by fitting of relative emission line intensities calculated from collisional-radiative model (CRM) to experimental ones. The model describes the kinetics of the first 40 excited states of neutral argon Ar and takes into account the following processes: electron impact excitation/deexcitation, spontaneous light emission, radiation trapping, electron impact ionization, and metastable quenching due to diffusion to walls. Then, ions density was determined from relative intensity of 488 nm Ar+ emission line and simple {CRM} accounting excitation from ground states of neutral Ar and ion Ar+. The values of electron and ion density agree very well. To test the stability of results, we performed Monte-Carlo calculations with random variation of experimental spectrum as well as of excitation cross-sections and estimated confidence intervals and errors for plasma parameters. Also, we validated {OES} study by comparison with Langmuir probe measurements. The agreement between optical and probe techniques is satisfactory.
机译:摘要光学发射光谱法(OES)与等离子发射模型的结合成为一种非侵入性的通用的等离子参数确定方法。在本文中,我们研究了在不同实验条件下脉冲{DC}磁控管的Ar等离子体中的载流子密度和电子温度。通过将由碰撞辐射模型(CRM)计算出的相对发射线强度与实验值拟合来确定电子密度和温度。该模型描述了中性氩气Ar的前40个激发态的动力学,并考虑了以下过程:电子碰撞激发/去激发,自发发光,辐射捕获,电子碰撞电离和由于扩散到壁而引起的亚稳态猝灭。然后,由488 nm Ar +发射线的相对强度和中性Ar和离子Ar +的基态引起的简单{CRM}激发来确定离子密度。电子和离子密度的值非常吻合。为了测试结果的稳定性,我们进行了蒙特卡洛计算,其中包括实验光谱以及激发截面的随机变化以及估计的置信区间和血浆参数的误差。此外,我们通过与Langmuir探针测量值进行比较来验证{OES}研究。光学和探针技术之间的协议是令人满意的。

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