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Deuterium retention in silicon carbide, SiC ceramic matrix composites, and SiC coated graphite

机译:碳化硅,SiC陶瓷基复合材料和SiC涂层石墨中的氘保留

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Silicon Carbide (SiC) is a low Z material discussed as an alternative to graphite for fusion devices. The retention of hydrogenous species is an important plasma-surface interaction property. Deuterium was implanted into SiC, SiCf/SiC, Cf/C-SiC and SiC coated graphite under various particle energy and substrate temperature conditions. A TDS process was used to characterise the deuterium retention of the implanted specimens. While all SiC materials show elevated retention levels compared to graphite, the differences are limited to about a factor of two over the range of parameters investigated.
机译:碳化硅(SiC)是一种低Z材料,已讨论用作聚变设备用石墨的替代品。氢物种的保留是重要的等离子体-表面相互作用性质。在各种粒子能量和衬底温度条件下,将氘注入SiC,SiCf / SiC,Cf / C-SiC和SiC涂覆的石墨中。 TDS工艺用于表征植入标本的氘保留。尽管所有SiC材料都显示出比石墨更高的保留水平,但在所研究的参数范围内,差异限制在大约两倍。

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